Atomic layer deposition of functional multicomponent oxides

Atomic Layer Deposition of High-k Oxides on Graphene

Graphene that is a single hexagonal layer of carbon atoms with very high intrinsic charge carrier mobility (more than 200 000 cm2/Vs at 4.2 K for suspended samples; Bolotin, et al., 2008) attracts attention as a promising material for future nanoelectronics. During last few years, significant advancement has been made in preparation of large-area graphene. The lateral sizes of substrates for gr...

Atomic Layer Deposition of TiO

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Robust, functional nanocrystal solids by infilling with atomic layer deposition.

Thin films of colloidal semiconductor nanocrystals (NCs) are inherently metatstable materials prone to oxidative and photothermal degradation driven by their large surface-to-volume ratios and high surface energies. (1) The fabrication of practical electronic devices based on NC solids hinges on preventing oxidation, surface diffusion, ripening, sintering, and other unwanted physicochemical cha...

Film growth model of atomic layer deposition for multicomponent thin films

Atomic layer deposition sALDd has become an essential technique for fabricating nano-scale thin films in the microelectronics industry, and its applications have been extended to multicomponent thin films, as well as to single metal oxide and nitride films. A mathematical film growth model for ALD is proposed to predict the deposition characteristics of multicomponent thin films grown mainly in...

Atomic layer deposition: an overview.